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LENN Series Filter Cartridge for Photoresist

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  • Description
  • Specification
  • Ordering Information

LENN filter cartridges are constructed of naturally hydrophilic Nylon membrane and PP components, especially developed for filtration in electronic industry. They are featured with low extractables, high adsorption and good mechanical strength. They are ideal for filtration of photoresist, developer, etchant, stripper and DI water in photolithography process, as well as some solvents. 
Features and Benefits
● Naturally hydrophilic Nylon membrane  
● Low extractables and high adsorption 
● High flow rates
● Excellent chemical compatibility
Quality
● Cartridges produced in a controlled environment
● Manufactured according to ISO9001 certified Quality Management System

Specification

LENN Series Filter Cartridge for Photoresist

Material of  construction

Membrane

Hydrophilic  Nylon66

Support  & Drainage

PP

Core & Cage

PP

End  Caps

PP

O-rings/Gasket

Silicone/EPDM/Viton/TEV

Sealing  Technology

Thermal  Bonding, No Adhesives 

Dimensions

Outer  Diameter

68mm (2.67 in)

Length

5”, 10”, 20”, 30”, 40”

Filtration Area

≥ 6.4 ft/10” (0.6 m/250mm)

Removal Ratings, μm

0.1, 0.22, 0.45, 1.0, 5.0, 10

Maximum Operating  Temperature 

A:  PP60140

B:  PP with stainless steel lined end cap85/185

C:  PP with stainless steel lining95/203

Maximum Forward  Differential Pressure

4.2 bar @ 23 ℃/60.9 psid @ 73.4

1.5bar@85 ℃/21.7 psid @ 185

0.6  bar @ 95 ℃/8.7psid @ 203

 

Ordering Information

LENN Series Filter Cartridge for Photoresist

LENN.jpg

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