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CMP Slurry Filtration Ultrapure/DI water -
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Inkjet Ink Filtration
Ultrapure/DI water
2015-03-10
Ultrapure/DI water is used in large volumes throughout the semiconductor manufacturing. The requirements for the DI water have become increasingly stringent these years.
Separation Goals
● Reliable retention of particulates and colloids
Application Requirements
● Filters must have low extractables, not to introduce foreigners.
● Filters must be flushed by pure water, to keep TOC under acceptable level.
● Terminal filters must keep reliable retention of particulates for a long time.
● Filters must provide consistent high flow rates and be robust to satisfy mass manufacturing processes.
Recommendation
Product | Description |
LEC | Activated Carbon Fiber, for RO pretreatment |
LEP/LEPF | Superior dirt-holding capacity, broad chemical compatibility, high flow rates |
LES | Long service life and high flow rates, absolute retention and integrity testable |
LENN | Low extractables and high throughputs, cost-effective |
LETA | Broad chemical compatibility, integrity testable and absolute retention for gas & air |
Application
Product | Process |
Hard disk media | Ultrasonic cleaning, spray and QDR slot |
Hard disk head | Ultra-pure water supply and circulation, Head Gimbal Assembly cleaning |
CD / DVD media | Base material flush, disc cleaning, de-ionized water supply |
LCD - FPD - OLED | Spray wash station, shower of deionized water, final cleaning |
Photovoltaic / solar cell | Silicon wafer cleaning, battery cleaning |
Typical Ultrapure Water System
Last Case: CMP Slurry Filtration
Next Case: No information!
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